Key Features:

• A vast world where vast, fierce battles are waiting to unfold
• Mysterious dungeons
• A multilayered story that begins with the outbreak of the Fourth World War
• A legendary, hidden guild
• Gameplay that focuses on connection between players
• Forgotten equipment and weapons; a situation where you can find new items while exploring
• Gradually increase your equipment as you explore the game world and experience an adventure
• Lv5 equipment with various functions… Can you use it?
• Class accommodation that allows you to freely choose your play style
• Possibility to freely customize your appearance
• A dedicated, full-featured GUI

Upon completing each battle, you receive experience points in the form of Experience Points (XP) that you can use to enhance certain attributes of your character. The attributes vary from attack, defense, to creating new commands and even resurrecting fallen companions. Characters that level up by experience can increase their physical strength, increase their attack power, unlock traits that maximize the use of each type of weapon, and more. An increase in Strength and Spirit strength acts as a bonus to battle, but their increase comes at the cost of attributes such as Speed or Jump.

You can combine some of the weapon types in order to create unique weapons. By equipping a mixture of short and long weapons such as swords, axes, or maces, your attack and defense will be increased.

Armor is divided into four classes based on the amount of attributes it provides. Class 1 (S) provides increased attributes such as Strength and Jump as well as bonus attack and defense attributes. Class 2 (M) provides the opposite, extra attributes such as Speed or Jump in exchange for Strength and Spirit. Class 3 (S+M) provides bonuses to both Strength and Spirit.

The increase of attributes will be determined by the increase of class, and the increase of a certain attribute will be limited as the skill level increases. For example, S+M armor only has a maximum of 2, S3 armor

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The ability to identify the three-dimensional shape of the surface of objects and their internal architecture is a central goal of optics. The ability to obtain three-dimensional images would have many useful applications, including but not limited to, the ability to better assess the three-dimensional configuration of the structures comprising devices which are manufactured in high-volume quantities, such as semiconductor and integrated circuit devices. Conventional microscopy techniques for three-dimensional imaging are based on interference between beams of light of different frequencies. The more the frequencies differ, the greater the resolving power of the system. For example, many Fourier transform techniques, used in conventional microscopy, include the Fourier transform of the intensity distribution (or amplitude) of the light reflected or transmitted by the object, which is used to reconstruct the three-dimensional profile of the object. More recently, other techniques have been developed to obtain three-dimensional images by measuring the interference pattern of light diffracted from and/or scattered by the object. One such technique is discussed in U.S. Pat. No. 4,286,262. Such interferometric systems, however, can be adversely affected by the presence of certain types of noise, such as speckle noise. Speckle is a form of granular noise that affects imaging systems, particularly coherent optical imaging systems, and is caused by the interference of coherently scattered light from a single spatial feature of the object being imaged. Often the object being imaged is a portion of a surface, such as a surface portion of a semiconductor wafer or optical disk, or is an object comprising multiple surface portions, such as a wafer or optical disk. Speckle noise is primarily undesirable in the imaging of objects comprising such surface portions because the coherent interference of light scattered from such a single or multiple surface portions leads to a speckled interference pattern and results in an image with lower resolution than is actually desired. One method which reduces the speckle noise in a coherent interference pattern is to illuminate the object with a partially coherent light. However, in some instances, such as in the imaging of semiconductor wafers which contain a plurality of surface portions, multiple coherently illuminated areas can lead to image resolution loss, and can lead to speckle noise in the interference pattern. Other methods which reduce speckle noise, such as the use of an incoherent illumination source, can yield an image with reduced speckle noise, but such systems are not designed for coherent imaging, and

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